{
 "id": "1.20d",
 "slug": "fab-materials-masks-gases-upstream-sputtering-targets",
 "url": "/parts/compute-silicon-and-packaging/fab-materials-masks-gases-upstream-sputtering-targets",
 "name": "Sputtering targets",
 "qualifiers": null,
 "layer": {
  "id": 1,
  "name": "Compute silicon & packaging"
 },
 "parent_id": "1.20",
 "children": [],
 "summary": "High-purity metal targets used in sputtering deposition steps during chip fabrication.",
 "description_md": null,
 "ai_delta": null,
 "bottleneck_status": null,
 "scale_tiers": [],
 "density_modes": [],
 "scale_notes": null,
 "flow": [
  "compute"
 ],
 "companies": [
  {
   "company_id": "jx-advanced-metals",
   "name": "JX Advanced Metals",
   "role": "manufacturer",
   "confidence": "inferred",
   "ownership_type": "public",
   "ticker": "5016.T",
   "product_note": null,
   "note": null,
   "source_url": null
  },
  {
   "company_id": "materion",
   "name": "Materion",
   "role": "manufacturer",
   "confidence": "inferred",
   "ownership_type": "public",
   "ticker": "MTRN",
   "product_note": null,
   "note": null,
   "source_url": null
  }
 ]
}