{
 "id": "1.20a",
 "slug": "fab-materials-masks-gases-upstream-photoresist",
 "url": "/parts/compute-silicon-and-packaging/fab-materials-masks-gases-upstream-photoresist",
 "name": "Photoresist",
 "qualifiers": null,
 "layer": {
  "id": 1,
  "name": "Compute silicon & packaging"
 },
 "parent_id": "1.20",
 "children": [],
 "summary": "Light-sensitive photoresist chemicals used to pattern each layer of a chip during lithography.",
 "description_md": null,
 "ai_delta": null,
 "bottleneck_status": null,
 "scale_tiers": [],
 "density_modes": [],
 "scale_notes": null,
 "flow": [
  "compute"
 ],
 "companies": [
  {
   "company_id": "dupont",
   "name": "DuPont",
   "role": "manufacturer",
   "confidence": "inferred",
   "ownership_type": "public",
   "ticker": "DD",
   "product_note": "/ Qnity (QNTY)",
   "note": null,
   "source_url": null
  },
  {
   "company_id": "fujifilm",
   "name": "Fujifilm",
   "role": "manufacturer",
   "confidence": "inferred",
   "ownership_type": "public",
   "ticker": "4901.T",
   "product_note": null,
   "note": null,
   "source_url": null
  },
  {
   "company_id": "shin-etsu",
   "name": "Shin-Etsu",
   "role": "manufacturer",
   "confidence": "inferred",
   "ownership_type": "public",
   "ticker": "4063.T",
   "product_note": null,
   "note": null,
   "source_url": null
  },
  {
   "company_id": "tokyo-ohka",
   "name": "Tokyo Ohka",
   "role": "manufacturer",
   "confidence": "inferred",
   "ownership_type": "public",
   "ticker": "4186.T",
   "product_note": null,
   "note": null,
   "source_url": null
  },
  {
   "company_id": "jsr",
   "name": "JSR",
   "role": "manufacturer",
   "confidence": "inferred",
   "ownership_type": "private",
   "ticker": null,
   "product_note": null,
   "note": "JIC",
   "source_url": null
  }
 ]
}